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W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target

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W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target

Model Number : Tungsten Sputtering Target

MOQ : Negotiate

Price : Negitionable

Payment Terms : L/C, D/A, D/P, T/T

Supply Ability : 10000sets/month

Delivery Time : 30 days after receiving down payment

Packaging Details : Standard export cartons

Name : Tungsten Sputtering Target

Shape : Round

Material : Tungsten

Chemical Composition : W 99.95% min.

Surface Condition : lathed, ground,polishing or mirror polishing

Application : wear resistant and corrosion resistant thin film coating

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Tungsten Rotatable Sputtering Target

Tungsten targets are mainly used in aerospace, rare earth smelting, electrical light sources, chemical equipment, medical equipment, metallurgical machinery, smelting equipment and petroleum etc..

PARAMETER

OD(mm)	ID(mm)	Length(mm)	Custom Made
140-300	120-280	100-3300	Custom Made

Model Number	W1
Shape	customized
Chemical Composition	99.95% W

Feature

1.High density
2.High wear-resistant
3.High thermal conductivity with low thermal expansion coefficient
4.High vibration-damping capacity and high Young’s modulus
5.High oxidation resistance and corrosion resistance

Specification

Atomic number	74
CAS number	7440-33-7
Atomic mass	183.84 [g/mol]
Melting point	3420 °C
Boiling point	5555 °C
Density at 20 °C	19.25 [g/cm3]
Crystal structure	Body-centered cubic
Coefficient of linear thermal expansion at 20 °C	4.410-6[m/(mK)]
Thermal conductivity at 20 °C	164 [W/(mK)]
Specific heat at 20 °C	0.13 [J/(gK)]
Electrical conductivity at 20 °C	18.2106[S/m]
Specific electrical resistance at 20 °C	0.055 [(mm2)/m]

APPLICATIONS

semiconductor

chemical vapor deposition (CVD)

physical vapor deposition (PVD) display

Product Tags:

Lathed Tungsten Products

Lathed Tungsten Sputtering Target

Rotatable Tungsten Sputtering Target

W1 Tungsten Products Rotatable Lathed Tungsten Sputtering Target Images

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